Collisional ion dynamics in capacitively coupled rf discharges

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 23, Issue 1, 2005, Pages 23-30

  Xiang, N ^a   Waelbroeck, F L ^a  

^a UNIVERSITY OF TEXAS AT AUSTIN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FLUID MODEL; RF DISCHARGES;

DYNAMICS; ELECTRIC CURRENTS; FREQUENCIES; VELOCITY MEASUREMENT;

IONS;

EID: 31144465514     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1821586     Document Type: Article

References (24)

1. M. A. Lieberman, IEEE Trans. Plasma Sci. 16, 638 (1988).
2. M. A. Lieberman, IEEE Trans. Plasma Sci. 17, 338 (1989).
3. V. A. Godyak and N. Sternberg, Phys. Rev. A 42, 2299 (1990).
4. A. Metze, D. W. Ernie, and H. J. Oskam, J. Appl. Phys. 60, 3081 (1986).
5. P. A. Miller and M. E. Riley, J. Appl. Phys. 82, 3689 (1997).
6. D. Bose, T. R. Govindan, and M. Meyyappan, J. Appl. Phys. 87, 7176 (2000).
7. M. A. Sobolewski, Phys. Rev. E 59, 1059 (1999).
8. Erik A. Edelberg and Eray S. Aydil, J. Appl. Phys. 86, 4799 (1999).
9. Hua-Tan Qiu, You-Nian Wang, and Teng-Cai Ma, J. Appl. Phys. 90, 5884 (2001).
10. M. A. Sobolewski, Phys. Rev. E 62, 8540 (2000).
11. N. Xiang and F. L. Waelbroeck, J. Appl. Phys. 93, 5034 (2003).
12. M. Goswami and H. Ramachandran, Phys. Plasmas 6, 4522 (1999).
13. N. Hershkowitz, IEEE Trans. Plasma Sci. 26, 1610 (1998).
14. Y. P. Raizer, M. N. Shneider, and N. A. Yatsenko, Radio-Frequency Capacitive Discharges (CRC, Boca Raton, FL, 1995).
15. V. A. Godyak and N. Sternberg, IEEE Trans. Plasma Sci. 18, 159 (1990).
16. J. Y. Jeong, S. E. Babayan, V. J. Tu, J. Park, R. F. Hcks, and G. S. Selwyn, Plasma Sources Sci. Technol. 7, 282 (1998).
17. H. W. Herrmann, I. Henins, J. Park, and G. S. Selwyn, Phys. Plasmas 6, 2284 (1999).
18. Jaeyoung Park, I. Henins, H. W. Herrmann, G. S. Selwyn, and R. F. Hiches, J. Appl. Phys. 89, 20 (2001).
19. T. E. Nitschke and D. B. Graves, IEEE Trans. Plasma Sci. 23, 717 (1995).
20. M. S. Barnes, T. J. Colter, and M. E. Elta, J. Appl. Phys. 61, 81 (1987).
21. M. A. Lieberman and A. J. Lichtenburg, Principles of Plasma Discharges and Materials Processing (Wiley, New York, 1994), Chap..
22. C. D. Child, Phys. Rev. 32, 492 (1911).
23. I. Langmuir, Phys. Rev. 33, 954 (1929).
24. E. Kawamura, V. Vahedi, M. A. Lieberman, and C. K. Birdsall, Plasma Sources Sci. Technol. 8, R45 (1999).