Oxide grown on polycrystal silicon by rapid thermal oxidation in N2 O

Journal of the Electrochemical Society

Volumn 153, Issue 2, 2006, Pages

  Kao, Chyuan Haur ^a   Lai, Chao Sung ^a   Lee, Chung Len ^b  

^a CHANG GUNG UNIVERSITY   (Taiwan)

^b NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; NITROGEN; OXIDATION; POLYSILICON; SILICON; TRANSMISSION ELECTRON MICROSCOPY;

ELECTRICAL CHARACTERISTICS; PHYSICAL STRUCTURES; RAPID THERMAL PROCESSING (RTP); THERMAL OXIDATION;

POLYCRYSTALLINE MATERIALS;

EID: 30644476976     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2138671     Document Type: Article

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