Characteristics of thin-film p-ZnMgO/n-ITO heterojunctions on glass substrates

Electrochemical and Solid-State Letters

Volumn 7, Issue 7, 2004, Pages

  Kim, Suku ^a   Kang, B S ^a   Ren, F ^a   Heo, Y W ^a   Ip, K ^a   Norton, D P ^a   Pearton, S J ^a  

^a University of Florida   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE; COATED MATERIALS; DIODES; ELECTRIC POTENTIAL; ETCHING; INDIUM COMPOUNDS; OHMIC CONTACTS; OPTOELECTRONIC DEVICES; PULSED LASER DEPOSITION; SUBSTRATES; THICK FILMS; THIN FILMS; ULTRAVIOLET DETECTORS; X RAY DIFFRACTION;

GLASS SUBSTRATES; PARAMETER ANALYZERS; SHEET RESISTANCE; WET ETCHING;

HETEROJUNCTIONS;

EID: 3042828446     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1738554     Document Type: Article

References (32)

1. D. C. Look, Mater. Sci. Eng. B, 80, 383 (2001).
2. P. Zu, Z. K. Tang, G. K. L. Wong, M. Kawasaki, A. Ohtomo, K. Koinuma, and Y. Sagawa, Solid State Commun., 103, 459 (1997).
3. D. M. Bagnall, Y. R. Chen, Z. Zhu, T. Yao, S. Koyama, M. Y. Shen, and T. Goto, Appl. Phys. Lett., 70, 2230 (1997).
4. M. Wraback, H. Shen, S. Liang, C. R. Gorla, and Y. Lu, Appl. Phys. Lett., 74, 507 (1999).
5. J.-M. Lee, K.-K. Kim, S.-J. Park, and W.-K. Choi, Appl Phys. Lett., 78, 2842 (2001).
6. J. E. Nause, III-V's Rev., 12, 28 (1999).
7. Y. Chen, D. Bagnell, and T. Yao, Mater. Sci. Eng. B, 75, 190 (2000).
8. D. C. Look, D. C. Reynolds, J. W. Hemsky, R. L. Jones, and J. R. Sizelove, Appl. Phys. Lett., 75, 811 (1999).
9. D. C. Look, J. W. Hemsky, and J. R. Sizelove, Phys. Rev. Lett., 82, 2552 (1999).
10. F. D. Auret, S. A. Goodman, M. Hayes, M. J. Legodi, H. A. van Laarhoven, and D. C. Look, Appl. Phys. Lett., 80, 956 (2002).
11. S. O. Kucheyev, J. E. Bradley, J. S. Williams, C. Jagerdish, and M. V. Swain, Appl. Phys. Lett., 80, 956 (2002).
12. D. C. Reynolds, D. C. Look, and B. Jogai, Solid State Commun., 99, 873 (1996).
13. M. Wraback, H. Shen, S. Liang, C. R. Gorla, and Y. Lu. Appl. Phys. Lett., 76, 507 (1999).
14. T. Aoki, D. C. Look, and Y. Hatanaka, Appl. Phys. Lett., 76, 3257 (2000).
15. C. C. Chang and Y. E. Chen, IEEE Trans. Ultrason. Ferroelectr. Freq. Control, 44, 624 (1997).
16. P. M. Verghese and D. R. Clarke. J. Appl. Phys., 87, 4430 (2000).
17. C. R. Gorla, N. W. Emanetoglu, S. Liang, W. E. Mayo, Y. Lu, M. Wraback, and H. Shen, J. Appl. Phys., 85, 2595 (1999).
18. H. Ohta, K. Kawamura, M. Orita, M. Hirano, N. Sarukura, and H. Hosono, Appl. Phys. Lett., 77, 475 (2000).
19. M. Joseph, H. Tabata, and T. Kawai, Jpn. J. Appl. Phys., Part 2, 38, L1205 (1999).
20. S. Krishnamoorthy, A. A. Iliadis, A. Inumpudi, S. Choopun, R. D. Vispute, and T. Venkatesan, Solid-State Electron., 46, 1631 (2002).
21. P. F. Garcia, R. S. McLean, M. H. Reilly, and G. Nunes, Jr., Appl. Phys. Lett., 82, 1117 (2003).
22. H. Ohta, K. Nomura, H. Hiramatsu, K. Ueda, T. Kamiya, M. Hirano, and H. Hosono, Solid-State Electron., 47, 2261 (2003).
23. K. Tonooka, H. Bando, and Y. Aiura, Thin Solid Films, In press.
24. H. Ohta, M. Kamiya, T. Kamiya, M. Hirano, and H. Hosono, Thin Solid Films, In press.
25. C. X. Wang, G. W. Yang, T. C. Zhang, H. W. Liu, Y. H. Han, J. F. Luo, C. X. Gao, and G. T. Zhou, Diamond Relat. Mater., In press.
26. Y. W. Heo, S. J. Park, K. Ip, S. J. Psarton, and D. P. Norton, Appl. Phys. Lett., 83, 1128 (2003).
27. A. B. M. Almamun Ashraft, I. Suemune, H. Kumano, and S. Tlanaka, Jpn. J. Appl. Phys., Part 2, 41, L1281 (2002).
28. E. H. Nicolian and J. R. Brews, MOS (Metal Oxide Semiconductor) Physics and Technology, J. Wiley & Sons, New York (1982).
29. E. R. Segnit and A. E. Holland, J. Am. Ceram. Soc., 48, 412 (1965).
30. A. Ohtomo, M. Kawasaki, T. Koida, K. Masubuchi, H. Koinuma, Y. Sakurai, Y. Yoshida, T. Yasuda, and Y. Segawa, Appl. Phys. Lett., 72, 2466 (1998).
31. V. V. N. Obreja. IEEE Trans. Electron Devices, 45, 155 (2002).
32. M. Trivedi and K. Shenai, J. Appl. Phys., 85, 6889 (1999).