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1
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0032275853
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Reliability projection for Ultra-thin oxides at low voltage
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J. H. Stathis and D. J. DiMaria, "Reliability projection for Ultra-thin oxides at low voltage," IEDM'98, pp. 167-169, 1998.
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(1998)
IEDM'98
, pp. 167-169
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Stathis, J.H.1
DiMaria, D.J.2
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2
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0032272375
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Ultra-thin gate oxides-Performance and Reliability
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H. Iwai and H. S. Momose, "Ultra-thin gate oxides-Performance and Reliability," IEDM Proc., pp. 163-166, 1998.
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(1998)
IEDM Proc.
, pp. 163-166
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Iwai, H.1
Momose, H.S.2
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3
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0013020208
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Oxide wearout, breakdown, and reliability
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D. J. Dumin, "Oxide wearout, breakdown, and reliability," International Journal of High Speed Electronics and Systems, vol. 11, pp. 617-718, 2001.
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(2001)
International Journal of High Speed Electronics and Systems
, vol.11
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Dumin, D.J.1
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4
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0037634817
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Modeling and experimental verification of the effect of gate oxide breakdown on CMOS inverters
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R. Rodriguez, J. H. Stathis, and B. P. Linder, "Modeling and experimental verification of the effect of gate oxide breakdown on CMOS inverters," presented at IRPS Proc., pp 11-16, 2003.
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(2003)
IRPS Proc.
, pp. 11-16
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Rodriguez, R.1
Stathis, J.H.2
Linder, B.P.3
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6
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0036712470
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The impact of gate-oxide breakdown on SRAM stability
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R. Rodriguez, J. H. Stathis, B. P. Linder, S. Kowalczyk, C. T. Chuang, R. V. Joshi, G. Northrop, K. Bernstein, A. J. Bhanvnagarwala, and S. Lombardo, "The impact of gate-oxide breakdown on SRAM stability," IEEE Transactions on Device Letters, vol. 23, pp. 559-561, 2002.
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IEEE Transactions on Device Letters
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Rodriguez, R.1
Stathis, J.H.2
Linder, B.P.3
Kowalczyk, S.4
Chuang, C.T.5
Joshi, R.V.6
Northrop, G.7
Bernstein, K.8
Bhanvnagarwala, A.J.9
Lombardo, S.10
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7
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0036494245
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Impact of MOSFET gate oxide breakdown on digital circuit operation and reliability
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B. Kaczer, R. Degraeve, M. Rasras, K. Van de Mieroop, P. J. Roussel, and G. Groeseneken, "Impact of MOSFET gate oxide breakdown on digital circuit operation and reliability," IEEE Transactions on Electron Devices, vol. 49, pp. 500-506, 2002.
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IEEE Transactions on Electron Devices
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Kaczer, B.1
Degraeve, R.2
Rasras, M.3
Van De Mieroop, K.4
Roussel, P.J.5
Groeseneken, G.6
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8
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0034453380
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Impact of MOSFET oxide breakdown on digital circuit operation and reliability
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B. Kaczer, R. Degraeve, G. Groeseneken, M. Rasras, S. Kubicek, E. Vandamme, and G. Badnes, "Impact of MOSFET oxide breakdown on digital circuit operation and reliability," presented at IEDM Tech. Dig., 2000.
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IEDM Tech. Dig.
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Kaczer, B.1
Degraeve, R.2
Groeseneken, G.3
Rasras, M.4
Kubicek, S.5
Vandamme, E.6
Badnes, G.7
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9
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0037973058
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Effect of gate oxide breakdown on RF device and circuit performance
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H. Yang, J. S. Yuan, and E. Xioa, "Effect of gate oxide breakdown on RF device and circuit performance," IRPS, 2003.
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IRPS
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Yang, H.1
Yuan, J.S.2
Xioa, E.3
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10
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0042991426
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Circuit implications of gate oxide breakdown
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J. H. Stathis, R. Rodriguez, and B. P. Linder, "Circuit implications of gate oxide breakdown," Microelectronics Reliability, vol. 43, pp. 1193-1197, 2003.
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(2003)
Microelectronics Reliability
, vol.43
, pp. 1193-1197
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Stathis, J.H.1
Rodriguez, R.2
Linder, B.P.3
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11
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0003476558
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IEEE Press
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R. J. Baker, H. W. Li, and D. E. Boyce, "CMOS: Circuit design, layout, and simulation," IEEE Press, 1998.
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(1998)
CMOS: Circuit Design, Layout, and Simulation
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Baker, R.J.1
Li, H.W.2
Boyce, D.E.3
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13
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85190302831
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Unpublished
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B. Cheek, N. Stutzke, S. Kumar, R. J. Baker, A. J. Moll, and W. B. Knowlton, "Unpublished."
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Cheek, B.1
Stutzke, N.2
Kumar, S.3
Baker, R.J.4
Moll, A.J.5
Knowlton, W.B.6
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14
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0032231207
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Influence of MOS transistor gate oxide breakdown on circuit performance
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T.-S. Yeoh and S.-J. Hu, "Influence of MOS transistor gate oxide breakdown on circuit performance," presented at ICSE'98, Bangi, Malaysia, pp. 59-63, 1998.
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(1998)
ICSE'98, Bangi, Malaysia
, pp. 59-63
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Yeoh, T.-S.1
Hu, S.-J.2
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15
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0038732515
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A model for gate-oxide breakdown in CMOS inverters
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R. Rodriguez, J. H. Stathis, and B. P. Linder, "A model for gate-oxide breakdown in CMOS inverters," IEEE Electron Device Letters, vol. 24, pp. 114-116, 2003.
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(2003)
IEEE Electron Device Letters
, vol.24
, pp. 114-116
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Rodriguez, R.1
Stathis, J.H.2
Linder, B.P.3
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16
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0035444824
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RF circuit performance degradation due to soft breakdown and hot-carrier effect in deep submicrometer CMOS technology
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Q. Li, J. Zhang, W. Li, J. S. Yuan, Y. Chen, and A. S. Oates, "RF circuit performance degradation due to soft breakdown and hot-carrier effect in deep submicrometer CMOS technology," IEEE Transactions on Microwave Theory and Techniques, vol. 49, pp. 1546-1551, 2001.
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IEEE Transactions on Microwave Theory and Techniques
, vol.49
, pp. 1546-1551
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Li, Q.1
Zhang, J.2
Li, W.3
Yuan, J.S.4
Chen, Y.5
Oates, A.S.6
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17
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0033342074
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Explanation of soft and hard breakdown and its consequences for area scaling
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M. A. Alam, B. Weir, J. Bude, P. Silverman, and D. Monroe, "Explanation of soft and hard breakdown and its consequences for area scaling," IEDM, pp. 449-452, 1999.
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(1999)
IEDM
, pp. 449-452
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Alam, M.A.1
Weir, B.2
Bude, J.3
Silverman, P.4
Monroe, D.5
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18
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0034498003
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Measurement technique, oxide thickness and area dependence of soft breakdown
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T. Nigram, R. Degraeve, G. Groeseneken, M. Heyns, and H. E. Maes, "Measurement technique, oxide thickness and area dependence of soft breakdown," presented at Materials Research Society Symposium, pp. 337-343, 2000.
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(2000)
Materials Research Society Symposium
, pp. 337-343
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Nigram, T.1
Degraeve, R.2
Groeseneken, G.3
Heyns, M.4
Maes, H.E.5
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