Modeling the parasitic chemical reactions of AlGaN organometallic vapor-phase epitaxy

Journal of Crystal Growth

Volumn 287, Issue 2, 2006, Pages 566-571

  Coltrin, Michael E ^a   Randall Creighton, J ^a   Mitchell, Christine C ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

A3. Metalorganic vapor phase epitaxy; A3. Organometallic vapor phase epitaxy; B1. Aluminum nitride; B1. Gallium nitride

Indexed keywords

ALUMINUM NITRIDE; CHEMICAL REACTIONS; COMPUTER SIMULATION; DECOMPOSITION; EPITAXIAL GROWTH; GALLIUM NITRIDE; METHANE; ORGANOMETALLICS;

GA-PRECURSOR DECOMPOSITION; ORGANOMETALLIC VAPOR PHASE EPITAXY; PARTICLE NUCLEATION; REACTOR CONDITIONS;

METALLORGANIC VAPOR PHASE EPITAXY;

EID: 30344469376     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2005.10.077     Document Type: Conference Paper

References (22)

1. J. Han, J.J. Figiel, M.H. Crawford, M.A. Banas, M.E. Bartram, R.M. Biefeld, Y.K. Song, and A.V. Nurmikko J. Crystal Growth 195 1998 291
2. C.H. Chen, H. Liu, D. Steigerwald, W. Imler, C.P. Kuo, M.G. Craford, M. Ludowise, S. Lester, and J. Amano J. Electron. Mater. 25 1996 1004
3. K. Sayyah, B.-C. Chung, and M. Gershenzon J. Crystal Growth 77 1986 424
4. F. Nakamura, S. Hashimoto, M. Hara, S. Imanaga, M. Ikeda, and H. Kawai J. Crystal Growth 195 1998 280
5. S.A. Safvi, J.M. Redwing, M.A. Tischler, and T.F. Kuech J. Electrochem. Soc. 144 1997 1789
6. J.R. Creighton, M.E. Coltrin, and W.G. Breiland Electrochem. Soc. Proc. PV 2002-3 2002 28
7. J.R. Creighton, W.G. Breiland, M.E. Coltrin, and R.P. Pawlowski Appl. Phys. Lett. 81 2002 2626
8. J.R. Creighton, G.T. Wang, W.G. Breiland, and M.E. Coltrin J. Crystal Growth 261 2004 204
9. J.R. Creighton, and K.C. Baucom Surf. Sci. 409 1998 372
10. J.R. Creighton J. Electron. Mater. 31 2002 1337
11. J.R. Creighton, D.D. Koleske, C.C. Mitchell, J. Crystal Growth, this issue, doi:10.1016/j.jcrysgro.2005.10.078.
12. D.D. Koleske, M.E. Coltrin, A.A. Allerman, K.C. Cross, C.C. Mitchell, and J.J. Figiel Appl. Phys. Lett. 82 2003 1170
13. W.G. Breiland, and K.P. Killeen J. Appl. Phys. 78 1995 6726
14. M.E. Coltrin, R.J. Kee, and G.H. Evans J. Electrochem. Soc. 136 1989 819
15. R.J. Kee, F.M. Rupley, J.A. Miller, M.E. Coltrin, J.F. Grcar, E. Meeks, H.K. Moffat, A.E. Lutz, G. Dixon-Lewis, M.D. Smooke, J. Warnatz, G.H. Evans, R.S. Larson, R.E. Mitchell, L.R. Petzold, W.C. Reynolds, M. Caracotsios, W.E. Stewart, P. Glarborg, C. Wang, C.L. McLellan, O. Adigun, W.G. Houf, C.P. Chou, S.F. Miller, P. Ho, P.D. Young, and D.J. Young CHEMKIN Release 4.0.2 2005 Reaction Design San Diego, CA
16. W.G. Breiland, and G.H. Evans J. Electrochem. Soc. 138 1991 1806
17. T. von Karman Z. Angew. Math. Mech. 1 1921 233
18. R.J. Kee, M.E. Coltrin, and P. Glarborg Chemically Reacting Flow: Theory and Practice 2003 Wiley Interscience Hoboken, NJ
19. S.K. Friedlander Smoke, Dust, and Haze: Fundamentals of Aerosol Dynamics 2000 Oxford University Press Oxford
20. M.G. Jacko, and S.J.W. Price Can. J. Chem. 41 1964 1560
21. J.R. Creighton, G.T. Wang, J. Phys. Chem. A (2005), submitted for publication.
22. D.M. Kremer, R.W. Davis, E.F. Moore, J.E. Maslar, D.R. Burgess Jr., and S.H. Ehrman J. Electrochem. Soc. 150 2003 G127