Electrieal properties and shrinkage of carbonized photoresist films and the implications for carbon microelectromechanical systems devices in conductive media

Journal of the Electrochemical Society

Volumn 152, Issue 12, 2005, Pages

  Park, Benjamin Y ^a   Taherabadi, Lili ^b   Wang, Chunlei ^a   Zoval, Jim ^a   Madou, Marc J ^b  

^a University of California at Irvine   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARBONIZATION; CONDUCTIVE MATERIALS; DECOMPOSITION; ELECTRIC CONDUCTIVITY; ELECTRIC PROPERTIES; MICROELECTROMECHANICAL DEVICES; NANOSTRUCTURED MATERIALS; SHRINKAGE; THIN FILMS; VISCOSITY;

3D MICROSTRUCTURES; CARBON MICROELECTROMECHANICAL SYSTEMS (C-MEMS);

PHOTORESISTS;

EID: 30344467260     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2116707     Document Type: Article

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