Photoresist-derived carbon for microelectromechanical systems and electrochemical applications

Journal of the Electrochemical Society

Volumn 147, Issue 1, 2000, Pages 277-282

  Ranganathan, Srikanth ^a   McCreery, Richard ^a   Majji, Sree Mouli ^b   Madou, Marc ^a,b  

^a OHIO STATE UNIVERSITY   (United States)

^b Ohio State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ATOMIC FORCE MICROSCOPY; CARBON; MICROELECTROMECHANICAL DEVICES; PHOTORESISTS; PYROLYSIS; RAMAN SPECTROSCOPY; REDOX REACTIONS; SCANNING ELECTRON MICROSCOPY; THERMOGRAVIMETRIC ANALYSIS; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

FOUR-POINT PROBE MEASUREMENTS; PHOTORESIST-DERIVED CARBON;

ELECTROCHEMICAL ELECTRODES;

EID: 0033888139     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1393188     Document Type: Article

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