Development of thin film electrodes based on sputtered amorphous carbon

Journal of the Electrochemical Society

Volumn 144, Issue 1, 1997, Pages 6-15

  Schlesinger, Roland ^a   Bruns, Michael ^a   Ache, Hans Joachim ^a  

^a KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; CAPACITANCE; CARBON; ELECTRIC RESISTANCE; MAGNETRON SPUTTERING; PH EFFECTS; PHYSICAL PROPERTIES; SILICON; SPUTTER DEPOSITION; SURFACE STRUCTURE; THIN FILMS; TITANIUM NITRIDE;

ELECTROCHEMICAL WINDOW; OHMIC RESISTANCE; RADIO FREQUENCY MAGNETRON SPUTTERING;

ELECTROCHEMICAL ELECTRODES;

EID: 0030834775     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837358     Document Type: Article

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