|
|
Volumn 149, Issue 3, 2002, Pages
|
|
Pyrolysis of negative photoresists to fabricate carbon structures for microelectromechanical systems and electrochemical applications
|
|
Author keywords
[No Author keywords available]
|
|
Indexed keywords
ADHESION;
CARBON;
CYCLIC VOLTAMMETRY;
DIFFERENTIAL THERMAL ANALYSIS;
ELECTROCHEMISTRY;
MICROELECTROMECHANICAL DEVICES;
PYROLYSIS;
SILICON WAFERS;
STRUCTURE (COMPOSITION);
THERMAL EFFECTS;
THERMOGRAVIMETRIC ANALYSIS;
TRANSMISSION ELECTRON MICROSCOPY;
CARBON FILMS;
CARBON STRUCTURES;
DEGREE OF CRYSTALLINITY;
GAS EVOLUTION;
NEGATIVE PHOTORESISTS;
PHOTORESISTS;
|
|
EID: 0036503738
PISSN: 00134651
EISSN: None
Source Type: Journal
DOI: 10.1149/1.1436085 Document Type: Article |
|
Times cited : (144)
|
|
References (17)
|
