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Volumn 80, Issue 1-2, 1996, Pages 1-7

Plasma-assisted deposition at atmospheric pressure

Author keywords

Atmospheric pressure discharges; Corona barrier discharges; Plasma assisted deposition; Plasma surface treatment; Pulse power technology

Indexed keywords

ACETYLENE; ATMOSPHERIC PRESSURE; DEPOSITION; ELECTRIC DISCHARGES; GLASS; PLASTIC FILMS; SURFACE TREATMENT; SURFACES; THIN FILMS;

EID: 0030105993     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/0257-8972(95)02676-2     Document Type: Article
Times cited : (75)

References (16)
  • 7
    • 0027677019 scopus 로고
    • Pulsed barrier discharge for thin film production at atmospheric pressure
    • U. Reitz, J.G.H. Salge and R. Schwarz, Pulsed barrier discharge for thin film production at atmospheric pressure, Surf. Coat. Technol., 59 (1993) 144-147.
    • (1993) Surf. Coat. Technol. , vol.59 , pp. 144-147
    • Reitz, U.1    Salge, J.G.H.2    Schwarz, R.3
  • 12
    • 0026369362 scopus 로고
    • Nonequilibrium volume plasma chemical processing
    • B. Eliasson and U. Kogelschatz, Nonequilibrium volume plasma chemical processing, IEEE Trans. Plasma Sci., 19 (6) (1991).
    • (1991) IEEE Trans. Plasma Sci. , vol.19 , Issue.6
    • Eliasson, B.1    Kogelschatz, U.2
  • 16
    • 0000319779 scopus 로고
    • Chemical modification of polymers, oxidation of polyacetylene
    • H.W. Gibson and J.M. Pochan, Chemical modification of polymers, oxidation of polyacetylene, Macromolecules, 15 (1982) 242-247.
    • (1982) Macromolecules , vol.15 , pp. 242-247
    • Gibson, H.W.1    Pochan, J.M.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.