The role of TiN in the intergranular phase-forming process in TiN-dispersed Si3N4 nanocomposites

Journal of the American Ceramic Society

Volumn 88, Issue 2, 2005, Pages 404-410

  Schmid, Herbert K ^a  

^a UNIVERSITY OF BONN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CERAMIC MATERIALS; ENERGY DISSIPATION; GRAIN BOUNDARIES; IMPURITIES; NANOSTRUCTURED MATERIALS; TRANSMISSION ELECTRON MICROSCOPY;

GRAIN BOUNDARY FILMS; INTERGRANULAR PHASE-FORMING PROCESS; PHASE IDENTIFICATION;

TITANIUM NITRIDE;

EID: 29744462176     PISSN: 00027820     EISSN: None     Source Type: Journal    
DOI: 10.1111/j.1551-2916.2005.00054.x     Document Type: Article

References (46)

1. G. Ziegler, J. Heinrich, and G. Wöttig, "Review: Relationships Between Processing, Microstructure and Properties of Dense and Reaction-Bonded Silicon Nitride," J. Mater. Sci., 22, 3041-86 (1987).
2. D. R. Clarke, "On the Equilibrium Thickness of Intergranular Glass Phases in Ceramic Materials," J. Am. Ceram. Soc., 70, 15-22 (1987).
3. 4 Ceramics, Edited by M. J. Hoffmann and G. Petzow. Kluwer Academic Publishers, Dordrecht, the Netherlands, 1994.
4. 4"; pp. 235-48 in Verstärkung Keramischer Werkstoffe. DGM-Informationsgesellschaft Verlag, Oberursel, Germany, 1991.
5. Y. G. Gogotsi, "Review: Particulate Silicon Nitride-Based Composites." J. Mater. Sci., 29, 2541-56 (1994).
6. H. K. Schmid, "Identification of Intergranular Phases in Ceramic Nanocomposites," J. Microsc., 194, 192-202 (1999).
7. G. Thomas, "Electron Microscopy and Microanalysis of Ceramics." J. Eur. Ceram. Soc., 16, 323-38 (1996).
8. H.-J. Kleebe, W. Braue, H. Schmidt, G. Pezzotti, and G. Ziegler, "Transmission Electron Microscopy of Microstructures in Ceramic Materials," J. Eur. Ceram. Soc., 16, 339-51 (1996).
9. G. Thomas and M. Gopal, "Electron Microscopy and Microanalysis of Advanced Materials," J. Eur. Ceram. Soc., 18, 1227-34 (1998).
10. L. K. L. Falk, "Electron Spectroscopic Imaging and Fine Probe EDX Analysis of Liquid Phase Sintered Ceramics," J. Eur. Ceram. Soc., 18, 2263-79 (1998).
11. D. B. Williams and C. B. Carter (eds.), Transmission Electron Microscopy: A Textbook of Materials Science. Plenum Press, New York, 1996.
12. D. B. Williams, Practical Analytical Electron Microscopy in Materials Science. Philips Electron Optics Publication Group, Mahwah, NJ, 1984.
13. U. Alber, H. Müllejans, and M. Rühle, "Improved Quantification of Grain Boundary Segregation by EDS in a Dedicated STEM," Ultramicroscopy, 69, 105-16 (1997).
14. H. Müllejans and J. Bruley, "Electron Energy-Loss Spectroscopy (EELS): Comparison with X-ray Analysis," J. Phys. IV, Colloque, C7, 2083-92 (1993).
15. M. T. Otten and W. M. J. Coene, "High-Resolution Imaging on a Field Emission TEM," Ultramicroscopy, 48, 77-91 (1993).
16. S. H. Stobbs, K. Sato, and W. M. Stobbs, "A Method for Using High Spatial Coherence and Defocus of a FEG-TEM for Interface Characterization, Proc. ICEM 13"; pp. 409-10 in Proceedings of ICEM 13, Paris, Vol. 1, les editions de physique, Edited by B. Jouffrey and C. Colliex. Les Ulis, France, 1994.
17. T. Tomita, M. Kawasaki, and R. Ravel-Chapuis, "Nanometer Area Analysis with Field Emission Electron Microscope"; pp. 721-2 in Proceedings of ICEM 13, Paris, Vol. 1, les editions de physique, Edited by B. Jouffrey and C. Colliex. Les Ulis, France, 1994.
18. Y. Bando, "Subnanometer Level Analysis by 300kV FE-ATEM"; pp. 591-4 in Proceedings of ICEM 13, Paris, Vol. 1, les editions de physique, Edited by B. Jouffrey and C. Colliex. Les Ulis, France, 1994.
19. R. F. Egerton, Electron Energy-Loss Spectroscopy in the Electron Microscope, 2nd edition, Plenum Press, New York, 1996.
20. R. Brydson, H. Sauer, W. Engel, and E. Zeitler, "EELS as a Fingerprint of the Chemical Co-Ordination of Light Elements," Microsc. Microanal. Microstruct., 2, 159-69(1991).
21. H. Müllejans and R. H. French, "Interband Electronic Structure of a Near-Ell Grain Boundary in α-Alumina Determined by Spatially Resolved Valence Electron Energy-Loss Spectroscopy," J. Phys. D, 29, 1751-60 (1996).
22. H. Müllejans and J. Bruley, "Improvements in Detection Sensitivity by Spatial Difference Electron Energy-Loss Spectroscopy at Interfaces in Ceramics," Ultramicroscopy, 53, 351-60 (1994).
23. H. Gu, M. Ceh, S. Stemmer, H. Müllejans, and M. Rühle, "A Quantitative Approach for Spatially Resolved Electron Energy-Loss Spectroscopy of Grain Boundaries and Planar Defects on a Subnanometer Scale," Ultramicroscopy, 59, 215-27 (1995).
24. H. Gu, R. M. Cannon, and M. Rühle, "Composition and Chemical Width of Ultrathin Amorphous Films at Grain Boundaries in Silicon Nitride," J. Mater. Res., 13, 376-87 (1998).
25. H. Gu, "ELNES Separation in Spatially Resolved Analysis of Grain Boundaries and Interfaces," Ultramicroscopy, 76, 159-72 (1999).
26. H. Gu, "Quantification of Interfacial Parameters in Spatially Resolved Analysis Involving ELNES Separation," Ultramicroscopy, 76, 173-85 (1999).
27. I. Tanaka, H.-J. Kleebe, M. K. Cinibulk, J. Bruley, D. R. Clarke, and M. Rühle, "Calcium Concentration Dependence of the Intergranular Film Thickness in Silicon Nitride," J. Am. Ceram. Soc., 77, 911-4 (1994).
28. 4 Ceramics, Edited by M. J. Hoffmann and G. Petzow. Kluwer Academic Publishers, Dordrecht, the Netherlands, 1994.
29. H. Gu, X. Pan, R. M. Cannon, and M. Rühle, "Dopant Distribution in Grain-Boundary Films in Calcia-Doped Silicon Nitride Ceramics," J. Am. Ceram. Soc., 81, 3125-35(1998).
30. 3-SiC Nanocomposites," J. Eur. Ceram. Soc., 18, 39-49 (1998).
31. K. M. Knowles and S. Turan, "The Dependence of Equilibrium Film Thickness on Grain Orientation at Interphase Boundaries in Ceramic-Ceramic Composites," Ultramicroscopy, 83, 245-59 (2000).
32. F. M. Ross and W. M. Stobbs, "A Study of the Initial Stages of the Oxidation of Silicon Using the Fresnel Method," Phil. Mag. A, 63, 1-36 (1991).
33. 4-TiN Composites," Corros. Sci., 33, 627-40 (1992).
34. R. Brydson, H. Sauer, W. Engel, J. M. Thomas, E. Zeitler, N. Kosugi, and H. Kuroda, "Electron Energy Loss and X-ray Absorption Spectroscopy of Rutile and Anatase: A Test of Structural Sensitivity," J. Phys.: Condens. Matter, 1, 797-812(1989).
35. H. J. Seifert, M. J. Hoffmann, and G. Petzow. "Phase Equilibria in the System Si-Ti-C-N"; pp. 131-5 in Proceedings of the 2nd ECerS Conference, Augsburg. 1991, DKG, Köln, Vol. 1. Edited by G. Ziegler and H. Hausner. DKG, Köln, Germany.
36. M. B. Trigg and E. R. McCartney, "Reactions in the System Si-Ti-O-N," J. Am. Ceram. Soc., 63, 103-4 (1980).
37. 4," J. Am. Ceram. Soc., 64, C-151-2 (1981).
38. M. K. Cinibulk, H. J. Kleebe, G. A. Schneider, and M. Rühle, "Amorphous Intergranular Films in Silicon Nitride Ceramics Quenched from High Temperatures," J. Am. Ceram. Soc., 76, 2801-8 (1993).
39. H. Gu, "Variation of Width and Composition of Grain-Boundary Film in a High Purity Silicon Nitride with Minimal Silica," J. Am. Ceram. Soc., 85, 33-7 (2002).
40. H.-J. Kleebe, "Comparison Between SEM and TEM Imaging Techniques to Determine Grain Boundary Wetting in Ceramic Polycrystals," J. Am. Ceram. Soc., 85, 43-8 (2002).
41. 4 Ceramics," J. Am. Ceram. Soc., 82, 3231-6 (1999).
42. G. J. Auchterlonie, D. R. McKenzie, and D. J. H. Cockayne, "Using ELNES with Parallel EELS for Differentiating Between a-Si:X Thin Films," Ultramicroscopy, 31, 217-22 (1989).
43. 4 Ceramics, Edited by M. J. Hoffmann and G. Petzow. Kluwer Academic Publishers, Dordrecht, the Netherlands, 1994.
44. 2," J. Am. Ceram. Soc., 85, 25-32 (2002).
45. R. E. Loehman, "Oxynitride Glasses," J. Non-Cryst. Solids, 42, 433-46 (1980).
46. R. R. Wusirika and C. K. Chyung, "Oxynitride Glasses and Glass-Ceramics," J. Non-Cryst. Solids, 38/39, 39-14 (1980).