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Volumn 16, Issue 21, 2004, Pages 3585-3596
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Strain-accelerated HF etching of AIAs for epitaxial lift-off
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Author keywords
[No Author keywords available]
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Indexed keywords
BENDING (DEFORMATION);
DEPOSITION;
EPITAXIAL GROWTH;
ETCHING;
EXTRAPOLATION;
HEAT LOSSES;
SEMICONDUCTING GALLIUM ARSENIDE;
SILICON;
SINGLE CRYSTALS;
SOLAR CELLS;
SOLUTIONS;
STRAIN;
THIN FILMS;
COMPRESSIVE STRAIN;
EPITAXIAL LIFT-OFF (ELO);
LATTICE MISMATCH;
TENSILE STRAIN;
ALUMINUM COMPOUNDS;
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EID: 2942657618
PISSN: 09538984
EISSN: None
Source Type: Journal
DOI: 10.1088/0953-8984/16/21/008 Document Type: Article |
Times cited : (13)
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References (23)
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