Defects and structure of hydrogenated microcrystalline silicon films deposited by different techniques

Journal of Non-Crystalline Solids

Volumn 338-340, Issue 1 SPEC. ISS., 2004, Pages 168-172

  Neto, A L B ^a   Dylla, T ^b   Klein, S ^b   Repmann, T ^b   Lambertz, A ^b   Carius, R ^b   Finger, F ^b  

^a FEDERAL RURAL UNIVERSITY OF RIO DE JANEIRO   (Brazil)

^b FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; CRYSTAL DEFECTS; CRYSTAL STRUCTURE; CRYSTALLINE MATERIALS; HYDROGENATION; METALLIC FILMS; PARAMAGNETIC RESONANCE; PHASE TRANSITIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; SOLAR CELLS; VOLUME FRACTION;

MICROCRYSTALLINE MATERIALS; PARAMAGNETIC DEFECTS; SILICON FILMS; SPIN DENSITIES;

SILICON COMPOUNDS;

EID: 2942620420     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2004.02.046     Document Type: Conference Paper

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