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Volumn 43, Issue 4 A, 2004, Pages

Investigation of shape transformation of silicon trenches during hydrogen annealing

Author keywords

Corner rounding; Hydrogen anneal; Silicon; Surface self diffusion; Transformation; Trench

Indexed keywords

ANISOTROPY; ANNEALING; CHEMICAL VAPOR DEPOSITION; CONDENSATION; DIFFUSION; HYDROGEN; METALLIC FILMS; MOSFET DEVICES; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; SILICA;

EID: 2942527629     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.43.l468     Document Type: Article
Times cited : (38)

References (18)
  • 15
    • 2942545656 scopus 로고    scopus 로고
    • K. Sudoh, H. Iwasaki, H. Kuribayashi, R. Hiruta and R. Shimizu: unpublished
    • K. Sudoh, H. Iwasaki, H. Kuribayashi, R. Hiruta and R. Shimizu: unpublished.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.