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Volumn 43, Issue 4 A, 2004, Pages
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Investigation of shape transformation of silicon trenches during hydrogen annealing
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Author keywords
Corner rounding; Hydrogen anneal; Silicon; Surface self diffusion; Transformation; Trench
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Indexed keywords
ANISOTROPY;
ANNEALING;
CHEMICAL VAPOR DEPOSITION;
CONDENSATION;
DIFFUSION;
HYDROGEN;
METALLIC FILMS;
MOSFET DEVICES;
REACTIVE ION ETCHING;
SCANNING ELECTRON MICROSCOPY;
SILICA;
CORNER ROUNDING;
HYDROGEN ANNEALING;
SHAPE TRANSFORMATIONS;
SILICON TRENCHES;
SURFACE SELF-DIFFUSION;
SEMICONDUCTING SILICON;
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EID: 2942527629
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/jjap.43.l468 Document Type: Article |
Times cited : (38)
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References (18)
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