Correlation between mechanical stress and optical properties of SiO 2/Ta2O5 multilayer UV narrow-bandpass filters deposited by plasma ion-assisted deposition

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5870, Issue , 2005, Pages 1-9

  Wang, Jue ^a   Maier, Robert L ^a  

^a Corning Tropel Corporation ^*  (United States)

Author keywords

Mechanical stress; Optical property; Plasma ion assisted deposition; UV narrow bandpass filter

Indexed keywords

ANNEALING; BANDPASS FILTERS; OPTICAL PROPERTIES; PLASMAS; SILICA; STRESS RELAXATION; TANTALUM COMPOUNDS;

MECHANICAL STRESS; PLASMA ION-ASSISTED DEPOSITION; UV NARROW-BANDPASS FILTER;

COATINGS;

EID: 29144506907     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.613285     Document Type: Conference Paper

References (13)

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13. th Annual Technical Conference, 220-223(2002)