Derivation of the center-wavelength shift of narrow-bandpass filters under temperature change

Optics Express

Volumn 12, Issue 23, 2004, Pages 5634-5639

  Kim, Sung Hwa ^a   Hwangbo, Chang Kwon ^a  

^a Inha University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ELASTICITY; ION BEAMS; MATRIX ALGEBRA; POISSON RATIO; SPUTTERING; STRAIN; THERMAL EXPANSION; THIN FILMS;

ELASTIC STRAIN; NARROW-BANDPASS FILTERS; PACKING DENSITY;

BANDPASS FILTERS;

EID: 10444261991     PISSN: 10944087     EISSN: None     Source Type: Journal    
DOI: 10.1364/OPEX.12.005634     Document Type: Article

References (6)

1. 2 films prepared by ion-assisted deposition using a gridless end-Hall ion source," Thin Solid Films 283, 84-89 (1996).
2. R.Y. Tsai, C.S. Chang, C.W. Chu, T. Chen, F. Dai, D. Lin, S. Yan, and A. Chang, "Thermally stable narrow-bandpass filter prepared by reactive ion-assisted sputtering," Appl. Opt. 40, 1593-1598 (2001).
3. A. Zöller, R. Götzelmann, K. Matl, and D. Gushing, "Temperature-stable bandpass filters deposited with plasma ion-assisted deposition," Appl. Opt. 35, 5609-5612 (1996).
4. H. Takashashi, "Temperature stability of thin-film narrow-bandpass filters produced by ion-assisted deposition," Appl. Opt. 34, 667-675 (1995).
5. H.A. Macleod, Thin-Film Optical Filters, 3rd ed. (IoP, Bristol, 2001).
6. Essential Macleod is commercial thin film software from Thin Film Center Inc, USA.