Quasi-Brewster angle technique for evaluating the quality of optical surfaces

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5375, Issue PART 2, 2004, Pages 1286-1294

  Wang, Jue ^a   Maier, Robert L ^a  

^a Corning Tropel Corporation ^*  (United States)

Author keywords

CaF2; Magnetorheological finishing; MgF2; Quasi Brewster angle; Subsurface damage; Surface contamination; Surface roughness

Indexed keywords

CAF2; MAGNETORHEOLOGICAL FINISHING; MGF2; QUASI-BREWSTER ANGLE; SUBSURFACE DAMAGE; SURFACE CONTAMINATION;

APPROXIMATION THEORY; ATOMIC FORCE MICROSCOPY; CRYSTALS; LIGHT ABSORPTION; LITHOGRAPHY; RHEOLOGY; SURFACE ROUGHNESS;

EXCIMER LASERS;

EID: 4344690329     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.533034     Document Type: Conference Paper

References (21)

1. V. Liberman, T. M. Bloomstein, M. Rothschild, J. H. C. Sedlacek, R. S. Uttaro, A. K. Bates, C. V. Peski, K. Orvek, "Materials issues for optical components and photomasks in 157nm lithography", J. Vac. Sci. Technol. B 17, 3273-3279(1999)
2. M. J. Weber (ed), Handbook of Optical Materials, Chapter 1, CRC Press (2003)
3. T. M. Bloomstein, "Controlled Contamination and Cleaning at 157nm (LITJ217) Annual Report", International SEMATECH Technology Transfer #01104175A-ENG (2001)
4. S. Gliech, J. Steinert, A. Duparré, "Light-scattering measurements of optical thin-film components at 157nm and 193nm", Applied Optics 41(16), 3224-3235(2002)
5. H. H. Karow, Fabrication Method for Precision Optics, Chapter 5, Wiley, New York (1993)
6. I. Zarudi, L. Zhang, "Subsurface damage in single-crystal silicon due to grind and polishing", J. Materials Sciences 15, 586-587(1996)
7. M. G. Schinker, "Subsurface damage mechanisms at high-speed ductile machining of optical glasses", Precision Engineering, 13(3), 208-218(1991)
8. J. C. Lambropoulos, S. D. Jacobs, B. Gillman, F. Yang, J. Ruckman, "Subsurface damage in microgrinding optical glasses", Ceramic Transaction 82, 469-474(1998)
9. T. Shibata, A. Ono, K. Kurihara, E. Makino, M. Ikeda, "Cross-section transmission electron microscope observation of diamond-turned single-crystal Si surfaces", Appl. Phy. Lett. 65, 2553-2555 (1994)
10. K. Sankaranarayanan, R. R. Sumathi, M. Udhayasankar, P. Jayavel, J. Kumar, "A new etchant to reveal the subsurface damage on polished gallium arsenide substrates", J. Crystal Growth 178, 229-232 (1997)
11. J. Lambropoulos, B. E. Gillman, Y. Zhou, S. D. Jacobs, H. J. Stevens, "Deterministic microgrinding, lapping, and polishing", SPIE 3134, 178-189 (1998)
12. U. Bismayer, E. Brinksmeier, B. Güttle, H. Seibt, C. Menz, "Measurement of subsurface damage in silicon wafers", Precision Engineering 16, 139-144 (1994)
13. Y. Gogotsi, C. Baek, F. Krirscht, "Raman microspectroscopy study of processing-induced phase transformation and residual stress in silicon", Semicond. Sci., 14, 936-944 (1999)
14. J. A. Randi, J. C. Lambropoulos, S. D. Jacobs, S. N. Shafrir, "Determination of subsurface damage in single crystalline optical materials", North America's Premier Optical Fabrication Technical Conference, 19-22 May 2003
15. Y. Ogita, K. Kobayashi, H. Daio, "Photoconductivity characterization of silicon wafer mirror-polishing subsurface damage related to gate oxide integrity", J. Crystal Growth 210, 36-39(2000)
16. 2 crystal by quasi-Brewster angle technique", Proc. SPIE 5188, 106-114 (2003)
17. J. A. Woollam Co., Inc., Guide to using WVASE32™
18. Aric B. Shorey, Stephen D. Jacobs, William I. Kordonski, Arie B. Shorey, Stephen D. Jacobs, William I. Kordonski, Roger F. Gans, "Experiments and observations regarding the mechanisms of glass removal in magnetorheological finishing", Applied Optics 40, 20-33(2001)
19. A. Macleod (ed.), Thin-film optical filters, Charter 2, Institute of Physics Publishing (2001)
20. D. A. G. Bruggemann, Ann. Phys. (Leipz.) 24, 636(1935)
21. H. K. Pulker, Coatings on Glass, Charter 4, Elsevier (1984)