Evolution of the microstructure, residual stresses, and mechanical properties of W-Si-N coatings after thermal annealing

Journal of Materials Research

Volumn 20, Issue 5, 2005, Pages 1356-1368

  Cavaleiro, Albano ^a   Marques, A P ^a   Fernandes, J V ^b   Carvalho, N J M ^c   De Hosson, J Th ^c  

^a UNIVERSITY OF COIMBRA   (Portugal)

^b UNIVERSITY OF COIMBRA   (Portugal)

^c UNIVERSITY OF GRONINGEN   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ANNEALING; COMPOSITION; CRYSTAL MICROSTRUCTURE; CRYSTALLIZATION; ELASTIC MODULI; HARDNESS; INORGANIC COATINGS; MECHANICAL PROPERTIES; RESIDUAL STRESSES; SPUTTER DEPOSITION; THERMAL EXPANSION;

AMORPHOUS COATING; REACTIVE SPUTTERING; THERMAL ANNEALING;

TUNGSTEN COMPOUNDS;

EID: 29144459930     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.2005.0169     Document Type: Article

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