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Thin Solid Films

Volumn 408, Issue 1-2, 2002, Pages 136-147

Composition, structure, microhardness and residual stress of W-Ti-N films deposited by reactive magnetron sputtering

(6) Shaginyan, L R a Misina M b Zemek, J b Musil, J b,c Regent, F c Britun, V F a

a FRANTSEVICH INSTITUTE FOR PROBLEMS OF MATERIALS SCIENCE (Ukraine)

b INSTITUTE OF PHYSICS (Czech Republic)

c UNIVERSITY OF WEST BOHEMIA (Czech Republic)

Author keywords

Alloys; Hardness; Nitrides; Sputtering

Indexed keywords

COMPOSITION; COMPRESSIVE STRESS; CRYSTAL MICROSTRUCTURE; FILM GROWTH; MAGNETRON SPUTTERING; MICROHARDNESS; MIXTURES; PARTIAL PRESSURE; RESIDUAL STRESSES; SUBSTRATES; TUNGSTEN ALLOYS;

REACTIVE MAGNETRON SPUTTERING;

THIN FILMS;

EID: 0037012544 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(02)00091-3 Document Type: Article

Times cited : (60)

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