Image optimization for maskless lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5374, Issue PART 2, 2004, Pages 637-647

  Shroff, Yashesh A ^a,b   Chen, Yijian ^a   Oldham, William G ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

IMAGE OPTIMIZATION; OPTICAL PATH DIFFERENCE (OPD); PATTERN GENERATION; WAVEFRONT MODULATION;

ALGORITHMS; IMAGE PROCESSING; LIGHTING; MASKS; MIRRORS; OPTICAL DESIGN; OPTIMIZATION; PHASE MODULATION; ROBUSTNESS (CONTROL SYSTEMS); WAVEFRONTS;

LITHOGRAPHY;

EID: 3843118714     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.548797     Document Type: Conference Paper

References (7)

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5. Alfred Wong, "Resolution Enhancement Techniques in Optical Lithography", SPIE press, pp. 80, 2000.
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