Phase-shifting optical maskless lithography enabling ASICs at the 65 and 45 nm nodes

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5567, Issue PART 1, 2004, Pages 529-544

  Sandstrom, Tor ^a   Ljungblad, Ulric ^a  

^a Micronic Laser Systems AB   (Sweden)

Author keywords

65nm; Maskless Lithography; Micro mirror; OPC; Phase shifting; PSM; SLM; Spatial light modulator; Tilt mirror; Tilting

Indexed keywords

APPLICATION SPECIFIC INTEGRATED CIRCUITS; IMAGE ANALYSIS; LIGHT MODULATORS; MASKS; MIRRORS; PHASE SHIFT;

65 NM; MASKLESS LITHOGRAPHY; MICRO-MIRROR; OPC; PSM; SPATIAL LIGHT MODULATORS (SLM); TILT-MIRROR; TILTING;

PHOTOLITHOGRAPHY;

EID: 19844364345     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.569258     Document Type: Conference Paper

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