New architecture for laser pattern generators for 130 nm and beyond

Proceedings of SPIE- The International Society for Optical Engineering

Volumn 4186, Issue , 2001, Pages 16-21

  Ljungblad, U ^a   Sandstro�m, T ^a   Buhre, H ^a   Du�rr, P ^a   Lakner, H ^a  

^a Micronic Laser Systems AB   (Sweden)

Author keywords

DUV; Micromirrors; Pattern generators; Photomasks; SLM

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; LASER APPLICATIONS; LIGHT MODULATION; MIRRORS; OPTICAL RESOLVING POWER; PHOTOLITHOGRAPHY; SCANNING;

LASER PATTERN GENERATORS; PHOTOMASKS;

MASKS;

EID: 0035046121     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.410691     Document Type: Article

References (3)

1. Deformable micromirror devices as phase modulating high resolution light valves