Influence of annealing on the ZnO film's optical properties

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4580, Issue , 2001, Pages 112-115

  Wang, Jinzhong ^a   Wang, Xinqiang ^a   Jiang, Xiuying ^a   Yang, Shuren ^a   Gao, Dingsan ^a   Du, Guotong ^a  

^a JILIN UNIVERSITY   (China)

Author keywords

Optical transmission; Plasma assisted MOCVD; XRD

Indexed keywords

ANNEALING; LIGHT TRANSMISSION; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTOR GROWTH; SPECTROMETERS; STRAIN; SUBSTRATES; TENSILE PROPERTIES; THIN FILMS; X RAY DIFFRACTION ANALYSIS; ZINC OXIDE;

OPTICAL TRANSMISSION SPECTRA; TENSILE STRAIN;

SEMICONDUCTING FILMS;

EID: 0035772468     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.444949     Document Type: Conference Paper

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