Atomic force microscopy study of micrometric pattern replica by hot embossing lithography

Microelectronic Engineering

Volumn 71, Issue 3-4, 2004, Pages 272-276

  Ressier, Laurence ^a   Martin, Christel ^a   Peyrade, Jean Pierre ^a  

^a INSA   (France)

Author keywords

Atomic force microscopy; Hot embossing lithography; PMMA; Resist flow

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRIC RESISTANCE; FLOW OF FLUIDS; MICROSTRUCTURE; MOLDING; POLYMETHYL METHACRYLATES; RELAXATION PROCESSES; SUBSTRATES;

HOT EMBOSSING LITHOGRAPHY; RESIST FLOW;

LITHOGRAPHY;

EID: 1842690432     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2004.01.036     Document Type: Article

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