The influence of varied sputtering condition on piezoelectric coefficients of AlN thin films

IEEE International Symposium on Applications of Ferroelectrics

Volumn , Issue , 2005, Pages 181-184

  Kao, Kuo Sheng ^a   Chung, Chung Jen ^b   Chen, Ying Chung ^b   Ou, Tien Fan ^b   Shing, Tai Kang ^c  

^a TUNG FANG INSTITUTE OF TECHNOLOGY   (Taiwan)

^b NATIONAL SUN YAT SEN UNIVERSITY   (Taiwan)

^c INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

Author keywords

Aluminum nitride; Periodic compression force; Piezoelectric coefficient

Indexed keywords

ALUMINUM NITRIDE; GROWTH (MATERIALS); MAGNETRON SPUTTERING; MULTILAYERS; PIEZOELECTRICITY; X RAY DIFFRACTION;

FULL WIDTH AT HIGH MAXIMUM (FWHM); GROWTH PARAMETERS; PERIODIC COMPRESSION FORCE; PIEZOELECTRIC COEFFICIENT;

THIN FILMS;

EID: 28144456777     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (14)

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