CO2, H2O, and CO2/H2O plasma chemistry for polyethylene surface modification

Langmuir

Volumn 18, Issue 6, 2002, Pages 2246-2253

  Médard, Nicolas ^a   Soutif, Jean Claude ^a   Poncin Epaillard, Fabienne ^a  

^a UNIVERSITÉ DU MAINE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON DIOXIDE; DEGRADATION; MASS SPECTROMETRY; MOLECULES; PLASMAS; REACTION KINETICS; SPECTRUM ANALYSIS; SURFACE TREATMENT; WATER;

PLASMA CHEMISTRY;

HIGH DENSITY POLYETHYLENES;

EID: 0037133883     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la011481i     Document Type: Article

References (29)

1. Harper, J.M.E. In Thin Film Process; Vossen, J.L., Kern, W., Eds.; Academic Press: New York, 1978; p 175.
2. Bottin, M.F.; Schreiber, H.P.; Klemberg-Sapieha, J.; Wertheimer, M.R. J. Appl. Polym, Sci., Polym. Symp. 1984, 38, 193-199.
3. d'Agostino, R. Plasma deposition, treatment, and etching of polymers; Academic Press: New York, 1990.
4. Kogoma, M.; Turban, G. Plasma Process. Symp. 1986, 68, 401-406.
5. Vallon, S.; Hofrichter, A.; Drevillon, B.; Klemberg-Sapieha, J.E.; Martinu, L.; Poncin-Epaillard, F. Thin Solid Films 1996, 68, 290-291.
6. Poncin-Epaillard, F.; Médard, N.; Soutif, J.C. Macromol. Chem. Phys. 2000, 201, 212-19.
7. Marais, S.; Metayer, M.; Labbe, M.; Valleton, J.M.; Alexandre, S.; Saiter, J.M.; Poncin-Epaillard, F. Surf. Coat. 1999, 122, 247-59.
8. Biederman, H.; Osada, Y. Adv. Polym. Sci., Polym. Phys. 1990, 95, 57-65.
9. Poncin-Epaillard, F.; Chevet, B.; Brosse, J.C. Eur. Polym. J. 1990, 26 (3), 333-339.
10. Médard, N.; Poncin-Epaillard, F.; Soutif, J.C.; Esteyries, C.; Lado, I. Macromol. Chem. Phys. 2001, 23 (11), 3005-3016.
11. Poncin-Epaillard, F.; Aouinti, M. Plasma Polym., in press.
12. Médard, N.; Soutif, J.C.; Poncin-Epaillard, F. Thin Solid Films, submitted for publication.
13. Médard, N.; Aouinti, M.; Poncin-Epaillard, F.; Bertrand, P. Surf. Interface Anal. 2001, 31, 1042-1047.
14. Ivanov, V.B.; Behnisch, J.; Mehdorn, F. Surf. Interface Anal. 1996, 24, 257-262.
15. Beamson, G.; Briggs, D. High-Resolution XPS of Organics Polymers; Wiley & Sons: Chichester, U.K., 1992.
16. Inagaki, N.; Tasaka, S.; Hibi, K. Polym. Prepr. 1990, 31 (2), 380-381.
17. Vargo, T.; Hook, D.J.; Gardella, J.A. J. Polym. Sci. 1991, 29, 535-545.
18. Kato, S.; Yamamoto, Y.; Okuyama, M. Joint Power Gen. Conf. 1997, 1, 497-499.
19. Kato, S.; Lee, S. J. Macroscale Thermophys. Eng. 1997, 1, 245-251.
20. Wu, D.; Outlaw, R.A.; Ash, R.L. J. Vac. Sci. Technol. 1996, A14 (2), 408-414.
21. Clark, D.T.; Wilson, R. J. Polym. Sci. 1983, 21, 837-853.
22. Podhajny, R.M. J. Plast. Film 1987, 4, 177-188.
23. Yasuda, H. Plasma Polymerization; Academic Press Inc.: Orlando, FL, 1985; p 168.
24. Dzioba, S.; Este, G.; Naguib, H.M. J. Electrochem. Soc. 1982, 129 (11), 2537-2541.
25. Battey, J.F. IEEE Trans. Electron Devices 1977, 24 (2), 140-145.
26. Koretsky, M.D.; Reimer, J.A. J. Appl. Phys. 1992, 72 (11), 5081-5088.
27. Lide, D.R. Handbook of Chemistry and Physics, 80th ed.; Weast, R.C., Ed.; CRC Press: Washington, DC, 1999; pp 9-51.
28. Ihara, T.; Ouro, T.; Ochiai, T.; Kiboku, M.; Irayama, Y. Bull. Chem. Soc. Jpn 1996, 69, 241-243.
29. Ricard, A. Reactive Plasmas; SFV: Paris, 1995; p 55.