Characterization of an Ar/O2 magnetron sputtering plasma using a Langmuir probe and an energy resolved mass spectrometer

Thin Solid Films

Volumn 494, Issue 1-2, 2006, Pages 18-22

  Palmero, A ^a   Van Hattum, E D ^a   Rudolph, H ^a   Habraken, F H P M ^a  

^a UTRECHT UNIVERSITY   (Netherlands)

Author keywords

Cathode poisoning; Langmuir probe; Magnetron sputtering

Indexed keywords

ARGON; CARRIER CONCENTRATION; CHARACTERIZATION; LANGMUIR BLODGETT FILMS; MAGNETRON SPUTTERING; MASS SPECTROMETRY;

CATHODE POISONING; ION DENSITY; LANGMUIR PROBE;

PLASMAS;

EID: 27944486113     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.07.154     Document Type: Conference Paper

References (21)

1. J. Musil, and J. Vlcek Mater. Chem. Phys. 54 1998 116
2. M. Brenda, and J. Musil Vacuum 55 1999 171
3. J. Kong, H. Shen, B. Chen, Z. Li, W. Shi, W. Yao, and Zh. Qi Thin Solid Films 207 1991 51
4. J. Musil, A.J. Bell, M. Cepera, and J. Zeman Surf. Coat. Technol. 96 1997 359
5. K. Wasa, and S. Hayakawa Handbook of Sputter Deposition and Technology 1992 Noyes Publication
6. L. Pekker Thin Solid Films 312 1998 341
7. N. Tomozeiu, E.E. van Faassen, A. Palmero, W.M. Arnoldbik, A.M. Vredenberg, and F.H.P.M. Habraken Thin Solid Films 447-448 2004 306
8. S. Berg, T. Larson, C. Nender, and H.-O. Blom J. Appl. Phys. 63 1988 887
9. A. Palmero, N. Tomozeiu, A.M. Vredenberg, W.M. Arnoldbik, and F.H.P.M. Habraken Surf. Coat. Technol. 177-178 2004 215
10. B. Fritsche, T. Chevolleau, J. Kourtev, A. Kolitsch, and W. Moller Vacuum 69 2003 139
11. P. Spatenka, J. Vlcek, and J. Blazek Vacuum 55 1999 165
12. D.J. Field, S.K. Dew, and R.E. Burrell J. Vac. Sci. Technol., A 20 2002 2032
13. B.W. Koo, N. Hershkowitz, and M. Sarfaty J. Appl. Phys. 86 1999 1213
14. M. Bagatin, D. Desideri, E. Martines, G. Manduchi, G. Serianni, and V. Antoni Rev. Sci. Instrum. 68 1997 365
15. D. Desideri, and G. Serianni Rev. Sci. Instrum. 69 1998 2354
16. M. Spolaore, V. Antoni, M. Bagatin, A. Buffa, R. Cavazzana, D. Desideri, E. Martines, N. Pomaro, G. Serianni, and L. Tramontin Surf. Coat. Technol. 116 1999 1083
17. A. Palmero, E.D. van Hattum, W.M. Arnoldbik, A.M. Vredenberg, and F.H.P.M. Habraken J. Appl. Phys. 95 12 2004 7611
18. E.D. van Hattum, A. Palmero, W.M. Arnoldbik, and F.H.P.M. Habraken Surf. Coat. Technol. 188-189 2004 399
19. J.A. Thornton, and J.E. Greene Rointan F. Bunshah Handbook of Deposition Technologies for Films and Coatings second edition 1994 Noyes Publications chapter 4
20. T.M. Minea, J. Bretagne, D. Pagnon, and M. Touzeau J. Phys. D: Appl. Phys. 33 2000 1884
21. T.M. Minea, J. Bretagne, G. Gousset, L. Magne, D. Pagnon, and M. Touzeau Surf. Coat. Technol. 116-119 1999 558