Experimental characterization of the deposition of silicon suboxide films in a radiofrequency magnetron reactive sputtering system

Surface and Coatings Technology

Volumn 188-189, Issue 1-3 SPEC.ISS., 2004, Pages 399-403

  van Hattum, E D ^a   Palmero, A ^a   Arnoldbik, W M ^a   Habraken, F H P M ^a  

^a UTRECHT UNIVERSITY   (Netherlands)

Author keywords

Magnetron; Radiofrequency; Reactive sputtering; Silicon oxide

Indexed keywords

CATHODES; MAGNETRONS; OXYGEN; PLASMAS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; THIN FILMS;

ELASTIC RECOIL DETECTION (ERD); ENERGY-RESOLVED MASS SPECTROMETER; OXYGEN FLOW; PLASMA CHARACTERIZATION;

SILICON COMPOUNDS;

SPUTTERING;

EID: 14644396591     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2004.08.034     Document Type: Article

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