Characterization of the plasma in a radio-frequency magnetron sputtering system

Journal of Applied Physics

Volumn 95, Issue 12, 2004, Pages 7611-7618

  Palmero, A ^a   Van Hattum, E D ^a   Arnoldbik, W M ^a   Vredenberg, A M ^a   Habraken, F H P M ^a  

^a UTRECHT UNIVERSITY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

CATHODES; ELECTRIC FIELDS; MAGNETIC FIELDS; MASS SPECTROMETERS; NATURAL FREQUENCIES; PLASMAS; PRESSURE EFFECTS; SPUTTER DEPOSITION; ULTRAHIGH VACUUM;

ELECTRON TEMPERATURE; ION DENSITY; PLASMA POTENTIAL; RADIO-FREQUENCY MAGNETRON SPUTTERING SYSTEM;

MAGNETRON SPUTTERING;

EID: 3142601602     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1728295     Document Type: Article

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