The structure of Cu-Al films prepared by unbalanced DC magnetron sputtering

Surface and Coatings Technology

Volumn 96, Issue 2-3, 1997, Pages 359-363

  Musil, J ^a   Bell, A J ^a   Cepera M ^b   Zeman, J ^b  

^a INSTITUTE OF PHYSICS   (Czech Republic)

^b NONE

Author keywords

Control of grain size; Magnetron sputtering; Nanostructured films

Indexed keywords

AMORPHOUS FILMS; FILM PREPARATION; GRAIN SIZE AND SHAPE; ION BOMBARDMENT; MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; SPUTTER DEPOSITION; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

MAGNETRON SPUTTER ION PLATING (MSIP);

METALLIC FILMS;

EID: 0031275864     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00357-5     Document Type: Article

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