Effect of high-energy electron-beam irradiation on the optical properties of ion-beam-sputtered silicon oxynitride thin films

Applied Optics

Volumn 44, Issue 29, 2005, Pages 6186-6192

  Karanth, Shivaprasad ^a   Shanbhogue, Ganesh H ^a   Nagendra, C L ^a  

^a INDIAN SPACE RESEARCH ORGANISATION   (India)

Author keywords

[No Author keywords available]

Indexed keywords

NITROGEN; OPTICAL PROPERTIES; REFRACTIVE INDEX; SILICON; SPUTTERING; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

ION-BEAM SPUTTERING; OXYNITRIDE FILMS; SILICON PHOTODETECTORS;

ELECTRON IRRADIATION;

EID: 27844508992     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.44.006186     Document Type: Article

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