Optical properties of Si3N4 Thin films produced by reactive D.C.-magnetron sputtering

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2253, Issue , 1994, Pages 1338-1342

  Rille, E ^a,b   Huter, M ^a  

^a UNIVERSITY OF INNSBRUCK   (Austria)

^b Leica Geosystems AG   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

BACKSCATTERING; COATINGS; DEPOSITION RATES; FIBER OPTIC SENSORS; FLOW OF GASES; GASES; LIGHT INTERFERENCE; MAGNETRON SPUTTERING; NITROGEN COMPOUNDS; REFRACTIVE INDEX; SILICON COMPOUNDS; THIN FILMS; WATER ABSORPTION;

D.C. MAGNETRON SPUTTERING; D.C. SPUTTERING; DIFFERENT SUBSTRATES; FUNDAMENTAL ABSORPTION EDGE; LOWER DENSITY; RUTHERFORD BACK-SCATTERING; TOTAL GAS PRESSURE; TRANSMISSION VALUE;

OPTICAL FILMS;

EID: 84893996691     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.192075     Document Type: Conference Paper

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