Control of silicon oxynitrides refractive index by reactive assisted ion beam sputter deposition

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2253, Issue , 1994, Pages 404-413

  Ida, M ^a   Chaton, P ^a   Rafin, B ^a  

^a CEA LETI   (France)

Author keywords

[No Author keywords available]

Indexed keywords

COATINGS; FIBER OPTIC SENSORS; ION BEAM ASSISTED DEPOSITION; IONS; LIGHT INTERFERENCE; NITRIDES; NITROGEN; NUCLEAR REACTIONS; OPTICAL CONSTANTS; OPTICAL CORRELATION; OXYGEN; PARTIAL PRESSURE; REFRACTIVE INDEX; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICA; SILICON NITRIDE; SPECTROSCOPIC ELLIPSOMETRY; SPUTTERING; STOICHIOMETRY;

EXTINCTION COEFFICIENTS; HIGH PACKING DENSITY; ION BEAM SPUTTER DEPOSITION; ION-BEAM SPUTTERING; NUCLEAR REACTION ANALYSIS; OXYGEN PARTIAL PRESSURE; PROCESS PARAMETERS; SILICON OXYNITRIDES;

ION BEAMS;

EID: 0042322765     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.192113     Document Type: Conference Paper

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