A study of silicon oxynitride film prepared by ion beam assisted deposition

Materials Letters

Volumn 58, Issue 17-18, 2004, Pages 2261-2265

  Wang, Yongjin ^a   Cheng, Xinli ^a   Lin, Zhilang ^a   Zhang, Changsheng ^a   Xiao, Haibo ^a   Zhang, Feng ^a   Zou, Shichang ^a  

^a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

Author keywords

Anti reflection coating; Ion beam assisted deposition; Silicon oxynitride film

Indexed keywords

AMORPHOUS MATERIALS; ANTIREFLECTION COATINGS; ELLIPSOMETRY; ION BEAM ASSISTED DEPOSITION; LIGHT REFLECTION; LIGHT TRANSMISSION; PARAMETER ESTIMATION; REFRACTIVE INDEX; SILICON COMPOUNDS; SILICON ON INSULATOR TECHNOLOGY; X RAY PHOTOELECTRON SPECTROSCOPY;

DEPOSITION CONTROL; REFLECTANCE LOSSES; SILICON OXYNITRIDE FILMS;

THIN FILMS;

EID: 2542468151     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2004.02.007     Document Type: Article

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