Use of wafer temperature determination for the study of unintentional parameter influences for the MOVPE of III-nitrides

Physica Status Solidi (B) Basic Research

Volumn 242, Issue 13, 2005, Pages 2581-2586

  Hardtdegen, H ^a   Kaluza, N ^a   Steins, R ^a   Cho, Y S ^a   Sofer, Z ^a   Zorn, M ^b   Haberland, K ^c   Zettler, J T ^c  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

^b LEIBNIZ INSTITUT FÜR HÖCHSTFREQUENZTECHNIK   (Germany)

^c LayTec Gesellschaft für In Situ und Nanosensorik mbH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 27844451017     PISSN: 03701972     EISSN: None     Source Type: Journal    
DOI: 10.1002/pssb.200541099     Document Type: Conference Paper

References (17)

1. H. Amano, N. Sawaki, I. Akasaki, and Y. Toyoda, Appl. Phys. Lett. 48, 353 (1986).
2. K. Haberland, A. Kaluza, M. Zorn, M. Pristovsek, H. Hardtdegen, M. Weyers, J.-T. Zettler, and W. Richter, J. Cryst. Growth 240, 87 (2002).
3. M. Dauelsberg, H. Hardtdegen, L. Kadinski, A. Kaluza, and P. Kaufmann, J. Cryst. Growth 223, 21 (2001).
4. F. G. Bobel, A. Wowchak, P. P. Chow, J. Van Hove, and L. A. Chow, Mater. Res. Soc. Symp. Proc. 324, 105 (1994).
5. R. Steins, N. Kaluza, H. Hardtdegen, M. Zorn, K. Haberland, and J.-T. Zettler, J. Cryst. Growth 272, 81 (2004).
6. D. E. Aspnes, Mater. Sci. Eng. B 30, 109 (1995).
7. M. Planck, Verh. Dtsch. Phys. Ges. 2, 202, 237 (1900).
8. G. Kirchhoff, Mber. Akad. Wiss. Berlin, Dec. 1859, in: Gesammelte Abhandlungen (Barth, Leipzig, 1882), p. 566.
9. P. J. Timans, J. Appl. Phys. 72, 660 (1992).
10. R. S. Balmer and T. Martin, J. Cryst. Growth 48, 216 (2003).
11. S. R. Johnson, C. Lavoie, T. Tiedje, and J. A. Mackenzie, J. Vac. Sci. Technol. B 11, 1007 (1993).
12. R.-C. Tu, C.-J. Tun, S.-M. Pan, H.-P. Liu, C.-E. Tsai, J. K. Sheu, C.-C. Chuo, T.-C. Wang, G.-C. Chi, and I.-G. Chen, IEEE Photon. Technol. Lett. 15, 1050 (2003).
13. K. Yanashima, S. Hashimoto, T. Hino, K. Funato, T. Kobayashi, K. Naganuma, T. Tojyo, T. Asano, T. Asatsuma, T. Miyajima, and M. Ikeda, J. Electron. Mater. 28, 287 (1999).
14. N. Kaluza, R. Steins, H. Hardtdegen, and H. Lueth, J. Cryst. Growth 272, 100 (2004).
15. H. Hardtdegen, N. Kaluza, R. Steins, P. Javorka, K. Wirtz, A. Alam, T. Schmitt, and R. Beccard, phys. stat. sol. (a) 202, 744 (2005).
16. H. X. Wang, Y. Amijima, Y. Ishihama, and S. Sakai, J. Cryst. Growth 233, 681 (2001).
17. D. D. Koleske, A. E. Wickendon, R. L. Henry, J. C. Culbertson, and M. E. Twigg, J. Cryst. Growth 223, 466 (2001).