Substrate temperature reference using SiC absorption edge measured by in situ spectral reflectometry

Journal of Crystal Growth

Volumn 248, Issue SUPPL., 2003, Pages 216-221

  Balmer, R S ^a   Martin, T ^a  

^a QINETIQ   (United Kingdom)

Author keywords

A1. Substrates; A3. Metalorganic vapor phase epitaxy; B1. Nitrides

Indexed keywords

ABSORPTION; METALLORGANIC VAPOR PHASE EPITAXY; PYROMETERS; SEMICONDUCTING ALUMINUM COMPOUNDS; SUBSTRATES; THERMODYNAMIC PROPERTIES;

SPECTRAL REFLECTOMETRY;

SILICON CARBIDE;

EID: 0037291648     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(02)01875-4     Document Type: Conference Paper

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