Fabrication of ZnO films by radio frequency magnetron sputtering and annealing

Rare Metals

Volumn 24, Issue 3, 2005, Pages 267-271

  Gao, Haiyong ^a   Zhuang, Huizhao ^a   Xue, Chengshan ^a   Wang, Shuyun ^a   Dong, Zhihua ^a   He, Jianting ^a  

^a SHANDONG NORMAL UNIVERSITY   (China)

Author keywords

Ammonia ambience; Annealing; Buffer layers; Radio frequency magnetron sputtering; ZnO films

Indexed keywords

ANNEALING; COMPOSITION; FABRICATION; MAGNETRON SPUTTERING; MORPHOLOGY; SCANNING ELECTRON MICROSCOPY; SILICON; THIN FILMS; VAPORIZATION; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

AMMONIA AMBIENCE; BUFFLE LAYERS; HEXAGONAL WURTZITE STRUCTURE; RADIO FREQUENCY MAGNETRON SPUTTERING; SEM; SI(111) SUBSTRATE; VOLATILIZATION PROCESS; XPS; XRD; ZNO FILMS;

ZINC OXIDE;

EID: 27244436584     PISSN: 10010521     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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