Formation of Al-doped ZnO films by dc magnetron reactive sputtering

Materials Letters

Volumn 48, Issue 3-4, 2001, Pages 194-198

  Chen, M ^a,b   Pei, Z L ^b   Sun, C ^b   Wen, L S ^b   Wang, X ^a  

^a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

^b INSTITUTE OF METAL RESEARCH   (China)

Author keywords

Al doped; Al enrichment; XPS; ZnO

Indexed keywords

ALUMINUM; CRYSTAL ORIENTATION; DOPING (ADDITIVES); FILM PREPARATION; MAGNETRON SPUTTERING; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC OXIDE;

DIRECT CURRENT MAGNETRON REACTIVE SPUTTERING;

CONDUCTIVE FILMS;

EID: 0035311985     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-577X(00)00302-5     Document Type: Article

References (18)