A fully-dry pecvd-oxynitride process for microgc column fabrication

Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 2005, Pages 774-777

  Agah, M ^a   Wise, K D ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BURIED-CHANNEL TECHNIQUE; COLUMN FABRICATION; DEPOSITION RATE; ETCH RATE;

CHEMICAL VAPOR DEPOSITION; CMOS INTEGRATED CIRCUITS; ETCHING; GAS CHROMATOGRAPHY; STRESS ANALYSIS;

NITRIDES;

EID: 26944432704     PISSN: 10846999     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/MEMSYS.2005.1454044     Document Type: Conference Paper

References (16)

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