Membranes of SiOxNy with 3D topography formed by PECVD for MEMS applications

Journal of Non-Crystalline Solids

Volumn 338-340, Issue 1 SPEC. ISS., 2004, Pages 788-792

  Lopes, A T ^a   Carreno M N P ^a  

^a UNIVERSITY OF SÃO PAULO   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

ACTUATORS; DIFFRACTIVE OPTICS; FILM GROWTH; MICROSTRUCTURE; OPTIMIZATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; SILICON COMPOUNDS; SURFACE TOPOGRAPHY; THICKNESS MEASUREMENT; THIN FILMS;

3D TOPOGRAPHY; CHEMICAL INERTNESS; MECHANICAL STRESS; SILICON SUBSTRATES;

MICROELECTROMECHANICAL DEVICES;

EID: 2942585213     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2004.03.092     Document Type: Conference Paper

References (10)

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