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Volumn 26, Issue 9, 2005, Pages 649-651

1330 V, 67 mΩ · cm2 4H-SiC(0001) RESURF MOSFET

Author keywords

Power device; Power MOSFET; Reduced surface field (RESURF); Silicon carbide (SIC)

Indexed keywords

COMPUTER SIMULATION; ELECTRIC BREAKDOWN; ELECTRIC RESISTANCE; HIGH TEMPERATURE EFFECTS; ION IMPLANTATION; OPTIMIZATION; POWER ELECTRONICS; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON CARBIDE;

EID: 26444532853     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/LED.2005.854371     Document Type: Article
Times cited : (38)

References (13)
  • 2
    • 0032302935 scopus 로고    scopus 로고
    • "High-voltage accumulationlayer UMOSFETs in 4H-SiC"
    • Jun
    • J. Tan, J. A. Cooper Jr, and M. R. Melloch, "High-voltage accumulationlayer UMOSFETs in 4H-SiC," IEEE Electron Device Lett., vol. 19, no. 6, pp. 487-489, Jun. 1998.
    • (1998) IEEE Electron Device Lett. , vol.19 , Issue.6 , pp. 487-489
    • Tan, J.1    Cooper Jr., J.A.2    Melloch, M.R.3
  • 4
    • 0242580986 scopus 로고    scopus 로고
    • "4H-SiC power MOSFET blocking 1200 V with a gate technology compatible with industrial applications"
    • D. Peters, R. Schörner, P. Friedrichs, and D. Stephani, "4H-SiC power MOSFET blocking 1200 V with a gate technology compatible with industrial applications," Mater Sci. Forum, vol. 433-436, pp. 769-772, 2003.
    • (2003) Mater. Sci. Forum , vol.433-436 , pp. 769-772
    • Peters, D.1    Schörner, R.2    Friedrichs, P.3    Stephani, D.4
  • 10
    • 12344276948 scopus 로고    scopus 로고
    • "Design and fabrication of RESURF MOSFETs on 4H-SiC(0001), (112̄0), and 6H-SiC(0001)"
    • Jan
    • T. Kimoto, H. Kosugi, J. Suda, Y. Kanzaki, and H. Matsunami, "Design and fabrication of RESURF MOSFETs on 4H-SiC(0001), (112̄0), and 6H-SiC(0001)," IEEE Trans. Electron Devices, vol. 52, no. 1, pp. 112-117, Jan. 2005.
    • (2005) IEEE Trans. Electron Devices , vol.52 , Issue.1 , pp. 112-117
    • Kimoto, T.1    Kosugi, H.2    Suda, J.3    Kanzaki, Y.4    Matsunami, H.5
  • 11
    • 3142675183 scopus 로고    scopus 로고
    • "Electronic behaviors of high-dose phosphorus-ion implanted 4H-SiC(0001)"
    • Y. Negoro, K. Katsumoto, T. Kimoto, and H. Matsunami, "Electronic behaviors of high-dose phosphorus-ion implanted 4H-SiC(0001)," J. Appl. Phys., vol. 96, pp. 224-228, 2004.
    • (2004) J. Appl. Phys. , vol.96 , pp. 224-228
    • Negoro, Y.1    Katsumoto, K.2    Kimoto, T.3    Matsunami, H.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.