-
1
-
-
0036539101
-
"Status and prospects for SiC power MOSFETs"
-
Jun
-
J. A. Cooper Jr, M. R. Melloch, R. Singh, A. Agarwal, and J. W. Palmour, "Status and prospects for SiC power MOSFETs," IEEE Trans. Electron Devices, vol. 49, no. 6, pp. 658-664, Jun. 2002.
-
(2002)
IEEE Trans. Electron Devices
, vol.49
, Issue.6
, pp. 658-664
-
-
Cooper Jr., J.A.1
Melloch, M.R.2
Singh, R.3
Agarwal, A.4
Palmour, J.W.5
-
2
-
-
0032302935
-
"High-voltage accumulationlayer UMOSFETs in 4H-SiC"
-
Jun
-
J. Tan, J. A. Cooper Jr, and M. R. Melloch, "High-voltage accumulationlayer UMOSFETs in 4H-SiC," IEEE Electron Device Lett., vol. 19, no. 6, pp. 487-489, Jun. 1998.
-
(1998)
IEEE Electron Device Lett.
, vol.19
, Issue.6
, pp. 487-489
-
-
Tan, J.1
Cooper Jr., J.A.2
Melloch, M.R.3
-
3
-
-
0036432241
-
2"
-
2," Mater Sci. Forum, vol. 389-393, pp. 1199-1202, 2002.
-
(2002)
Mater Sci. Forum
, vol.389-393
, pp. 1199-1202
-
-
Sugawara, Y.1
Asano, K.2
Takayama, D.3
Ryu, S.4
Singh, R.5
Palmour, J.W.6
Hayashi, T.7
-
4
-
-
0242580986
-
"4H-SiC power MOSFET blocking 1200 V with a gate technology compatible with industrial applications"
-
D. Peters, R. Schörner, P. Friedrichs, and D. Stephani, "4H-SiC power MOSFET blocking 1200 V with a gate technology compatible with industrial applications," Mater Sci. Forum, vol. 433-436, pp. 769-772, 2003.
-
(2003)
Mater. Sci. Forum
, vol.433-436
, pp. 769-772
-
-
Peters, D.1
Schörner, R.2
Friedrichs, P.3
Stephani, D.4
-
5
-
-
2442689483
-
2, 600-V double-epitaxial MOSFETs in 4H-SiC"
-
Apr
-
2, 600-V double-epitaxial MOSFETs in 4H-SiC," IEEE Electron Device Lett., vol. 25, no. 4, pp. 292-294, Apr. 2004.
-
(2004)
IEEE Electron Device Lett.
, vol.25
, Issue.4
, pp. 292-294
-
-
Harada, S.1
Okamoto, M.2
Yatsuo, T.3
Adachi, K.4
Fukuda, K.5
Arai, K.6
-
6
-
-
26444508504
-
"4H-SiC DMOSFETs for high speed switching applications"
-
S. Ryu, S. Krishnaswami, M. Das, J. Richmond, A. Agarwal, J. Palmour, and J. Scofield, "4H-SiC DMOSFETs for high speed switching applications," Mater. Sci. Forum, vol. 483-485, pp. 797-800, 2005.
-
(2005)
Mater. Sci. Forum
, vol.483-485
, pp. 797-800
-
-
Ryu, S.1
Krishnaswami, S.2
Das, M.3
Richmond, J.4
Agarwal, A.5
Palmour, J.6
Scofield, J.7
-
8
-
-
0242664947
-
"4H-SiC lateral RESURF MOSFET with a buried channel structure"
-
S. Suzuki, S. Harada, T. Yatsuo, R. Kosugi, J. Senzaki, and K. Fukuda, "4H-SiC lateral RESURF MOSFET with a buried channel structure," Mater. Sci. Forum, vol. 433-436, pp. 753-756, 2003.
-
(2003)
Mater. Sci. Forum
, vol.433-436
, pp. 753-756
-
-
Suzuki, S.1
Harada, S.2
Yatsuo, T.3
Kosugi, R.4
Senzaki, J.5
Fukuda, K.6
-
9
-
-
1942486799
-
2 lateral two-zone RESURF MOSFETs in 4H-SiC with NO annealing"
-
Mar
-
2 lateral two-zone RESURF MOSFETs in 4H-SiC with NO annealing," IEEE Electron Device Lett., vol. 25, no. 3, pp. 185-187, Mar. 2004.
-
(2004)
IEEE Electron Device Lett.
, vol.25
, Issue.3
, pp. 185-187
-
-
Wang, W.1
Banerjee, S.2
Chow, T.P.3
Gutmann, R.J.4
-
10
-
-
12344276948
-
"Design and fabrication of RESURF MOSFETs on 4H-SiC(0001), (112̄0), and 6H-SiC(0001)"
-
Jan
-
T. Kimoto, H. Kosugi, J. Suda, Y. Kanzaki, and H. Matsunami, "Design and fabrication of RESURF MOSFETs on 4H-SiC(0001), (112̄0), and 6H-SiC(0001)," IEEE Trans. Electron Devices, vol. 52, no. 1, pp. 112-117, Jan. 2005.
-
(2005)
IEEE Trans. Electron Devices
, vol.52
, Issue.1
, pp. 112-117
-
-
Kimoto, T.1
Kosugi, H.2
Suda, J.3
Kanzaki, Y.4
Matsunami, H.5
-
11
-
-
3142675183
-
"Electronic behaviors of high-dose phosphorus-ion implanted 4H-SiC(0001)"
-
Y. Negoro, K. Katsumoto, T. Kimoto, and H. Matsunami, "Electronic behaviors of high-dose phosphorus-ion implanted 4H-SiC(0001)," J. Appl. Phys., vol. 96, pp. 224-228, 2004.
-
(2004)
J. Appl. Phys.
, vol.96
, pp. 224-228
-
-
Negoro, Y.1
Katsumoto, K.2
Kimoto, T.3
Matsunami, H.4
-
13
-
-
19844374505
-
2O oxidation"
-
2O oxidation," Jpn. J. Appl. Phys., vol. 44, pp. 1213-1218, 2005.
-
(2005)
Jpn. J. Appl. Phys.
, vol.44
, pp. 1213-1218
-
-
Kimoto, T.1
Kanzaki, Y.2
Noborio, M.3
Kawano, H.4
Matsunami, H.5
|