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Volumn 67, Issue 3, 2003, Pages 856-867

Plasma-enhanced chemical vapor deposited silicon carbide as an implantable dielectric coating

Author keywords

Biocompatibility; Dielectrics; Passivation; Silicon carbide; Stability

Indexed keywords

AMORPHOUS SILICON; DISSOLUTION; HISTOLOGY; IMPLANTS (SURGICAL); MICROELECTRODES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 0346124147     PISSN: 00219304     EISSN: None     Source Type: Journal    
DOI: 10.1002/jbm.a.10152     Document Type: Article
Times cited : (141)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.