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Journal of Ceramic Processing Research

Volumn 4, Issue 2, 2003, Pages 96-100

Indium tin oxide thin films deposited by RF-magnetron sputtering for organic electro-luminescence devices

(5) Kim, Kyu Hyun a Choi, Kyoon a Choi, Eui Seok a Hwang, Jin Ha b Hwang, Jeung Tae c

a Korea Institute of Ceramic Engineering and Technology (KICET) (South Korea)

b Hong Ik University (South Korea)

c Alpha Display Co (South Korea)

Author keywords

Indium tin oxide(ITO); Organic electroluminescence(EL); RF sputtering

Indexed keywords

ARGON; INDIUM TIN OXIDE; OXIDE; UNCLASSIFIED DRUG;

ARTICLE; CRYSTAL; DEVICE; FILM; FLOW RATE; LOW TEMPERATURE PROCEDURES; LUMINESCENCE; MICROWAVE OVEN; PRESSURE; RADIOFREQUENCY; SURFACE PROPERTY; THICKNESS;

EID: 2542625822 PISSN: 12299162 EISSN: None Source Type: Journal
DOI: None Document Type: Article

Times cited : (6)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.