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Volumn 2, Issue 1, 2001, Pages 38-42

Low temperature deposition of the in2o3-sno2, sno2, and sio2 on the plastic substrate by dc magnetron sputtering

Author keywords

Conductive layer; Indium tin oxide (In2O3 SnO2; ITO); SiO2; SnO2; Thin film; roll sputtering

Indexed keywords


EID: 2542623823     PISSN: 15980316     EISSN: 21581606     Source Type: Journal    
DOI: 10.1080/15980316.2001.9651848     Document Type: Article
Times cited : (1)

References (8)
  • 5
    • 36749104834 scopus 로고
    • Highly conductive and transparent zinc oxide films prepared by rf magnetron sputtering under applied external field
    • Minami, T., Nanto, H., and Takata, S., 1982. “Highly conductive and transparent zinc oxide films prepared by rf magnetron sputtering under applied external field,”. Appl. Phys. Lett., 41:958–960.
    • (1982) Appl. Phys. Lett. , vol.41 , pp. 958-960
    • Minami, T.1    Nanto, H.2    Takata, S.3
  • 6
    • 0021370957 scopus 로고
    • Electrical and optical properties of zinc oxide thin films prepared by rf magnetron sputtering for transparent electrode applications
    • Nanto, H., Minami, T., Shooji, S., and Takata, S., 1984. “Electrical and optical properties of zinc oxide thin films prepared by rf magnetron sputtering for transparent electrode applications,”. J. Appl. Phys., 55:1029–1034.
    • (1984) J. Appl. Phys. , vol.55 , pp. 1029-1034
    • Nanto, H.1    Minami, T.2    Shooji, S.3    Takata, S.4
  • 7
    • 0022146289 scopus 로고
    • Group III impurity doped zinc oxide thin films prepared by RF magnetron sputtering
    • Minami, T., Sato, H., Nanto, H., and Takata, S., 1985. “Group III impurity doped zinc oxide thin films prepared by RF magnetron sputtering,”. Jpn. J. Appl. Phys., 24:L781–784.
    • (1985) Jpn. J. Appl. Phys. , vol.24 , pp. L781-L784
    • Minami, T.1    Sato, H.2    Nanto, H.3    Takata, S.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.