The importance of network structure in high-k dielectrics: LaAlO 3, Pr 2O 3, and Ta 2O 5

Journal of Applied Physics

Volumn 98, Issue 4, 2005, Pages

  Busani, T ^a,b   Devine, R A B ^a,c  

^a AIR FORCE RESEARCH LABORATORY   (United States)

^b CNRS   (France)

^c UNIVERSITY OF NEW MEXICO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

NETWORK STRUCTURES; POLYCRYSTALLINE PHASE;

AMORPHOUS MATERIALS; POLYCRYSTALLINE MATERIALS; RARE EARTH ADDITIONS;

PERMITTIVITY;

EID: 25144448097     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2012513     Document Type: Article

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