Characterizing the demons in high-NA phase-shifting masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5567, Issue PART 1, 2004, Pages 445-455

  Robins, Garth C ^a   Neureuther, Andrew R ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Aberration; Aberration monitor; Focus monitor; High NA; Illumination; Image; Intensity imbalance; Interference; Phase shifting mask; Printable artifact; Resist image; Zernike aberrations

Indexed keywords

ABERRATIONS; COMPUTER SIMULATION; ELECTRIC FIELD EFFECTS; ELECTROMAGNETIC FIELD EFFECTS; IMAGE ANALYSIS; LIGHT INTERFERENCE; OPTICAL VARIABLES MEASUREMENT; PHASE SHIFT; PHOTORESISTS; SCANNING ELECTRON MICROSCOPY; VECTORS;

ABERRATION MONITOR; FOCUS MONITOR; HIGH-NA; IMAGE; INTENSITY IMBALANCE; PHASE-SHIFTING MASK; PRINTABLE ARTIFACT; RESIST IMAGE; ZERNIKE ABERRATIONS;

MASKS;

EID: 19844372782     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.568758     Document Type: Conference Paper

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