High-power and high-repetition-rate EUV source based on Xe discharge-produced plasma

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5751, Issue II, 2005, Pages 927-934

  Teramoto, Yusuke ^a   Sato, Hiroto ^a   Bessho, Kazunori ^a   Niimi, Gohta ^a   Shirai, Takahiro ^a   Yamatani, Daiki ^a   Takemura, Tetsu ^a   Yokota, Toshio ^b   Paul, Khokan C ^b   Kabuki, Kiyoyuki ^a   Miyauchi, Koji ^a   Ikeuchi, Mitsuru ^a   Hotta, Kazuaki ^a   Yoshioka, Masaki ^a   Toyoda, Koichi ^a  

^a Extreme Ultra Violet Lithography System Development Association   (Japan)

^b USHIO INC   (Japan)

Author keywords

Capillary; DPP; EUV source; Lithography; Pulsed power; Z pinch

Indexed keywords

CAPILLARY FLOW; COOLING; INDUCTANCE; LITHOGRAPHY; PINCH EFFECT; ULTRAVIOLET RADIATION; XENON;

CAPILLARY; DISCHARGE-PRODUCED PLASMA (DPP); EUV SOURCES; PULSED POWER; Z-PINCH;

PLASMAS;

EID: 24644467682     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.602021     Document Type: Conference Paper

References (9)

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