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Advanced Metallization Conference (AMC)

Volumn , Issue , 2004, Pages 627-632

In situ observation of initial nucleation and growth processes in chemical vapor deposition and supercritical fluid deposition of copper

(3) Momose, Takeshi a Sugiyama, Masakazu a Shimogaki, Yukihiro a

a UNIVERSITY OF TOKYO (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COALESCENCE; LASER BEAMS; NUCLEATION; PARTIAL PRESSURE; SEMICONDUCTOR GROWTH; SUPERCRITICAL FLUIDS; ULSI CIRCUITS;

DEPOSITION TEMPERATURE; FILM MORPHOLOGY; NUCLEATION DENSITY; SUPERCRITICAL FLUID DEPOSITION (SCFD); SURFACE REFLECTIVITY;

COPPER;

EID: 23844517738 PISSN: 15401766 EISSN: None Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper

Times cited : (5)

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