Lens aberration effect on the line width for different pattern shapes and duty ratios

Journal of the Korean Physical Society

Volumn 47, Issue 1, 2005, Pages 47-53

  Lee, Ji Eun ^a   Park, Seung Wook ^a   An, Ilsin ^a   Oh, Hye Keun ^a   Lee, Chang Ho ^b  

^a Hanyang University   (South Korea)

^b SAMSUNG Electronics   (South Korea)

Author keywords

Duty ratio; Lithography; Simulation; Zernike aberration

Indexed keywords

EID: 23744463965     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (11)

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