Resolution enhancement method using an apodized mask

Journal of the Korean Physical Society

Volumn 41, Issue 5, 2002, Pages 687-692

  Park, Seungwook ^a   Kwon, Youngkeun ^a   Oh, Hye Keun ^a  

^a Hanyang University   (South Korea)

Author keywords

Apodization; Lithography; Resolution

Indexed keywords

EID: 0036863486     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (8)

1. Eun-Mi Lee, Moon-Gyu Sung, Young-Mi Lee, Young-Soo Sohn, Heung-Jin Bak, Il-Sin An and Hye-Keun Oh, J. Korean Phys. Soc. 89, 147 (2001).
2. Young-Soo Sohn, Eun-Mi Lee, Moon-Gyu Sung, Young-Mi Lee, Heung-Jin Bak, Il-Sin An and Hye-Keun Oh, J. Korean Phys. Soc. 39, 152 (2001).
3. Eun-Jung Seo, Heung-Jin Bak, Sang-Kon Kim; Young-Soo Sohn and Hye-Keun Oh, J. Korean Phys. Soc. 40, 725 (2002).
4. Burn J. Lin, SPIE (San Jose, March, 1992).
5. Naomasa Shiraishi, Shigera Hirukawa, Yuichiro Takeuchi and Nobataka Magome, SPIE 1674, 741 (1992).
6. Eugene Hecht, Optics, 2nd ed. (Addison-Wesley, New York, 1987).
7. Hye-Keun Oh, Jeong-Ung Koo, Young-Min Cho, Byoung-Sun Park, Hai-Bin Chung and Heung-Joun Yoo, SPIE 2440, 838, (1995).
8. Joseph W. Goodman, Introduction to Fourier Optic (McGraw-Hill, New York, 1984).